Dow Electronic Materials
ArF Implant Resist
Product Category: Resists
Positive tone 193 nm implant resist has a good profile through pitch and excellent substrate compatibility.
Features
- 130 nm 1:2 trench
- 130 nm ISO trench
- 130 nm 1:2 line and space
- 130 nm ISO line
Benefits
- Improved bright to dark field bias
- Excellent process window performance
- Good profile through pitch
- Excellent substrate compatibility
130 nm 1:2 Trench
130 nm ISO Trench
130 nm 1:2 L/S
130 nm ISO Line
Figure 1: 150 nm, 120 °C/30S HMDS, Annular 0.75NA, 0.5/0.25, SB/PEB=100°C/120°C